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Beilstein J. Nanotechnol. 2018, 9, 2599–2608, doi:10.3762/bjnano.9.241
Figure 1: Scheme of the formation of the gold nanoislands.
Figure 2: SEM images of 2.8 nm Au films on a Si(111) substrate: a) as prepared, annealed at b) 150 °C, c) 200...
Figure 3: SEM images of 2.8 nm Au films on a Si(111) substrate annealed at a) 450 °C, b) 550 °C, c) 600 °C fo...
Figure 4: SEM images of Au films of different thicknesses on a Si(111) substrate annealed at 550 °C for 15 mi...
Figure 5: a) Number of nanoparticles and b) average diameter of nanoparticles as function of the Au film thic...
Figure 6: Left: AFM image of a 2.8 nm Au film on a Si(111) substrate annealed at 550 °C for 15 min; right: cr...
Figure 7: XRD result of a 2.8 nm Au film annealed at 550 °C for 15 min and an as-prepared 2.8 nm Au film on S...
Figure 8: XPS (Au region) results for the 2.8 nm Au thin film on a Si(111) substrate annealed at 550 °C for 1...
Figure 9: XPS result (Si region) for the 2.8 nm Au film on a Si(111) substrate annealed at 550 °C for 15 min.
Figure 10: Absorbance spectra recorded for a 2.8 nm Au film on a Si(111) substrate annealed at 550 °C for 15 m...
Figure 11: SEM image of the gold nanoislands on the silicon substrate (sample 2.8 nm Au film on Si(111) substr...
Figure 12: Setup for the FDTD and FDTD/DFT simulations. Left: view from the bottom, zx-plane; yellow rectangle...
Figure 13: Calculated intensity distribution of the electromagnetic field with unpolarized incident light of a...
Figure 14: Calculated amplitudes of the components of the electromagnetic field with unpolarized incident ligh...
Figure 15: Calculated absorbance (as log(Io/Ir), where Io is an incident flux, and Ir – reflected flux), as th...